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Tungsten crucible

Product No.：Tungsten melting crucibles
Material Grade：99.95%
Size：Customized
Test：mechnical and chemical
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High purity melting Tungsten crucibles

High temp tungsten crucible with Corrosion resistant

The general sizes are:

Types	Diameter (mm)	Height (mm)	Wall thickness(mm)
Rods Hollowing and Turning Crucible	15~80	15~150	2~10
Spinning crucible	50~500	15~500	1~4
Welding crucibles	50~500	15~500	1.5~5
Sintered crucibles	80~1000	50~1000	5>

Chemical Composition- Tungsten 99.95%min.

Element	Composition, max, %	Permissible Variations in Check Analysis, %
C	0.01	+/-0.002
O	0.01	+10% relative
N	0.01	+0.001
Fe	0.01	+0.001
Ni	0.01	+0.001
Si	0.01	+0.001

Tungsten crucibles are containers made from tungsten metal that are used in various high-temperature applications, particularly in industries such as electronics, metallurgy, and chemical processing. Here are some key points about tungsten crucibles:

High melting point: Tungsten has one of the highest melting points among all metals, around 3,410 degrees Celsius (6,170 degrees Fahrenheit). This property makes tungsten crucibles suitable for handling materials at extremely high temperatures.

Refractory properties: Tungsten is highly refractory, meaning it has excellent resistance to heat and thermal shock. Tungsten crucibles can withstand rapid temperature changes without cracking or warping, making them ideal for processes involving rapid heating and cooling.

Corrosion resistance: Tungsten is resistant to many corrosive substances, including acids and alkalis, which makes tungsten crucibles suitable for handling reactive materials and harsh chemical environments.

Vacuum and inert atmosphere applications: Tungsten crucibles are commonly used in vacuum and inert atmosphere applications, such as crystal growth, sintering, and heat treatment. They can maintain a clean and controlled environment, preventing contamination of the materials being processed.

Semiconductor industry: Tungsten crucibles are widely used in the production of semiconductors. They are used in processes like chemical vapor deposition (CVD) and physical vapor deposition (PVD) to hold and melt materials like silicon, gallium arsenide, and other semiconductor compounds.